PECVD DEPOSITION SERVICES
Aegis has developed a PECVD process optimized for amorphous silicon, silicon nitride and silicon dioxide yielding very high optical quality, low absorptivity and proven stability, for applications operating in the wavelength region 800-2500 nm. The Aegis process is the basis for Aegis tunable optical filters which have been shown to meet stringent Telcordia and Milspec reliability standards. Aegis amorphous semiconductor coatings are capable of and compatible with:
- High refractive index for filters with broad angular acceptance
- Low absorption and scattering at the 1.5 µm communications band
- Low temperature deposition
- High uniformity with superb transmitted wavefront quality & apertures to 100 mm
- Large thermo-optic coefficient for maximum thermal tunability when desired
- Compliant and low stress films
- Well characterized mechanical properties
- Filters on solid substrates including silicon wafer or fused silica
Applications for Aegis PECVD coatings include: fiber optic communications filters, free space laser communications filters, chemical sensors, and special purpose military infrared imaging systems.
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